A. Satrapinski, O. Hahtela, A. Savin, S. Novikov, N. Lebedeva
{"title":"Temperature dependence of Pd thin film cryo resistors","authors":"A. Satrapinski, O. Hahtela, A. Savin, S. Novikov, N. Lebedeva","doi":"10.1109/CPEM.2010.5544226","DOIUrl":null,"url":null,"abstract":"Cryo resistors based on Pd thin films were designed and investigated in temperature range 50 mK – 300 K. The resistors in the range 100 kΩ – 1.3 MΩ were fabricated using thermal evaporation technique. Minimum temperature coefficient, −0.4 (37)·10{−6}/K, in temperature range 50 mK – 100 mK has been obtained for 20 nm thin film 560 kΩ resistor. Binary and decimal configuration of connection of resistive elements were used for flexible adjustment of resistance value.","PeriodicalId":222495,"journal":{"name":"CPEM 2010","volume":"13 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"CPEM 2010","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CPEM.2010.5544226","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
Cryo resistors based on Pd thin films were designed and investigated in temperature range 50 mK – 300 K. The resistors in the range 100 kΩ – 1.3 MΩ were fabricated using thermal evaporation technique. Minimum temperature coefficient, −0.4 (37)·10{−6}/K, in temperature range 50 mK – 100 mK has been obtained for 20 nm thin film 560 kΩ resistor. Binary and decimal configuration of connection of resistive elements were used for flexible adjustment of resistance value.