Transient overvoltage induced failure of MOS-controlled thyristor under ultra-high di/dt condition

Chao Liu, Wanjun Chen, H. Tao, Yijun Shi, Xuefeng Tang, Wuhao Gao, Qi Zhou, Zhaoji Li, Bo Zhang
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引用次数: 6

Abstract

In this paper, the transient overvoltage induced failure during high di/dt discharge is studied based on a cathode-short MOS controlled thyristor (CS-MCT). The intrinsic reason of this failure is that the pulse current with high di/dt flowing though the inherent parasitic cathode inductance, produces a high transient overvoltage that makes breakage of the gate oxide. The mechanism of the transient overvoltage is theoretically detailed. A simple solution is proposed by adding a second emitter lead, which is called the Kelvin connection. The Kelvin emitter greatly clamps the overvoltage at high di/dt condition, preventing gate oxide from being broken down. The advantage of Kelvin connection against the normal connection was experimentally demonstrated and validated.
超高di/dt条件下mos控制晶闸管瞬态过电压诱发失效
本文研究了基于阴极短型MOS控制晶闸管(CS-MCT)的高di/dt放电瞬态过电压诱发失效。这种故障的内在原因是高di/dt的脉冲电流流过固有的寄生阴极电感,产生高瞬态过电压,使栅氧化物破裂。从理论上详细阐述了瞬态过电压产生的机理。提出了一个简单的解决方案,即增加第二个发射极引线,称为开尔文连接。开尔文发射极在高di/dt条件下极大地箝制过电压,防止栅极氧化物被击穿。实验证明了开尔文连接相对于普通连接的优越性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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