Impacts of Dielectric Constant on Performance Study of CNTFET

M. Hasan, Washik Adnan, Nafisa Anjum, Riffat Ara Islam Ritu, Md. Faysal Nayan
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Abstract

Because of its compact size and unique ballistic, thermal management, and low resistive capabilities, the CNTFET is an efficient semiconductor device. The tiny contact space makes Schottky barriers exceedingly thin, allowing the device to function adequately. Furthermore, the characteristics of ballistic conduction, as well as the deep influence of gate capacitance and the influence of dielectric constant on performance, have contributed gaining its popularity in the emerging nano industry. This investigation exclusively examines the ION current, IOFF current, and their ratio (ION/IOFF) of CNTFETs, which is considerably affected by temperature and gate insulator dielectric constant. A numerical modeling was used to investigate the impact of dielectric permittivity on the functionality of a CNTFET. Furthermore, the CNTFET’s superb mobility and functionality are enabled by its low temperature and excellent dielectric constant.
介电常数对CNTFET性能研究的影响
由于其紧凑的尺寸和独特的弹道,热管理和低电阻能力,CNTFET是一种高效的半导体器件。极小的接触空间使得肖特基屏障非常薄,使设备能够充分发挥作用。此外,弹道传导的特性,以及栅电容和介电常数对性能的深刻影响,使其在新兴的纳米工业中获得了广泛的应用。本研究专门研究了cntfet的离子电流、IOFF电流及其比(ION/IOFF),这在很大程度上受温度和栅极绝缘体介电常数的影响。采用数值模拟方法研究了介电常数对CNTFET功能的影响。此外,CNTFET的极好的移动性和功能是由其低温和优异的介电常数实现的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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