K. Zhang, U. Bhattacharya, L. Ma, Y. Ng, B. Zheng, M. Bohr, S. Thompson
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引用次数: 19
Abstract
A 50 Mb SRAM chip is designed and fabricated on an industry leading 90 nm CMOS technology that features a 1 /spl mu/m/sup 2/ SRAM cell and 50 nm gate length transistors with strained silicon. The SRAM chip is formed with 100/spl times/512 Kb subarrays that have 2.5 GHz nominal operating frequency, 75% area efficiency, and fully synchronized internal timing along with efficient local power-down feature. And the design can be easily re-configured to form large high-density on-die cache memory for high-speed logic applications such as CPUs.