Electron Beam Assisted MOCVD For Quantum Wires And Boxes

Abstract

Mesoscopic and/or quantum microstructures have recently received great attentions, since new physical phenomena with applications to semiconductor lasers and other functional optical devices are expected[ 1,2]. To fabricate this quantum microstructures, use of wet chemical etchings[3], reactive ion etchings[4], ion beam implantaions[5] and ion beam millings[6,7] have been investigated. These methods, however, suffer from free surface effects, creation of a damage field during implantation. To avoid these problems, selective growth techniques on masked substrates[8,9] and nonplanar substrates[ 10-121 have been also investigated. In particular, use of both metal-organic chemical vapor deposition (MOCVD) selective growth technique and electron beam (EB) lithography technique would play important roles. In this paper, we discuss fabrication technologies for quantum wires and quantum boxes with emphasis on these electron-beam assisted M O O technologies.