Performance of AlGaN/GaN based Common Drain Dual HEMT (CDD-HEMT) for high power applications

Praveen Pal, Yogesh Pratap, Mridula Gupta, S. Kabra
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Abstract

In this paper, two- 2DEG channels of AlGaN/GaN HEMT are created with Common Drain on a single GaN substrate for improving high power performance of the device. The results obtained for Common Drain Dual HEMT (CDDHEMT) have been compared with conventional HEMT. The results obtained for CDD-HEMT show higher drain current, current gain, cut-off frequency and transconductance. Drain current of CDD-HEMT is three times greater than conventional HEMT. Transconductance is three times higher in comparasion to conventional HEMT. CDD-HEMT has potential applications in high power high frequency domain.
高功率应用中基于AlGaN/GaN的共漏双HEMT (CDD-HEMT)性能
为了提高器件的高功率性能,本文在单一GaN衬底上利用共漏建立了AlGaN/GaN HEMT的2 - 2g通道。并将共漏双HEMT (CDDHEMT)与常规HEMT进行了比较。结果表明,CDD-HEMT具有较高的漏极电流、电流增益、截止频率和跨导性。CDD-HEMT的漏极电流是传统HEMT的3倍。跨导性是传统HEMT的三倍。CDD-HEMT在大功率高频领域具有潜在的应用前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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