Mc-Si thin film solar cells by fast CVD on low cost SSP pre-ribbons

F. Faller, N. Schillinger, A. Hurrle, C. Schetter, A. Eyer
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引用次数: 5

Abstract

Silicon films 40-90 /spl mu/m thick were epitaxially deposited on fast-grown mc-SSP pre-ribbons. Special attention was focused on the design of the authors' self-constructed CVD system. It is principally convertable into a conveyer-belt system for a high continuous throughput, which is needed to be economically competitive. With high deposition rates of up to 10 /spl mu/m/min, the epi-layers revealed diffusion lengths of 250 /spl mu/m on <100>-Cz substrates, 150 /spl mu/m on SILSO and 11-30 /spl mu/m on SSP pre-ribbons (all substrates highly doped). Solar cells were manufactured using the authors' standard cell process. No passivation or gettering steps were performed and no texturing was applied. Solar cell efficiencies of 12.8% on Cz, 11.1% on SILSO wafers and 6.1% on SSP were achieved.
低成本SSP预带快速CVD制备Mc-Si薄膜太阳能电池
在快速生长的mc-SSP预带上外延沉积了厚度为40-90 /spl mu/m的硅膜。重点介绍了自建CVD系统的设计。它主要是转换成一个输送带系统的高连续吞吐量,这是需要在经济上具有竞争力。随着沉积速率高达10 /spl mu/m/min,外接层在-Cz衬底上的扩散长度为250 /spl mu/m,在SILSO衬底上的扩散长度为150 /spl mu/m,在SSP预带上的扩散长度为11-30 /spl mu/m(所有衬底都高度掺杂)。太阳能电池是使用作者的标准电池工艺制造的。没有执行钝化或获取步骤,也没有应用纹理。太阳能电池在Cz上的效率为12.8%,在SILSO晶圆上的效率为11.1%,在SSP上的效率为6.1%。
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