Cross-sectional SEM-EBIC analysis of semi-vertical GaN power diodes

J. Priesol, A. Šatka, M. Borga, A. Minj, B. Bakeroot, K. Geens
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引用次数: 0

Abstract

Electron beam induced current (EBIC) technique has been used to study depletion regions at the cross-sections of semi-vertical Gallium Nitride (GaN) p-n-and n: -p-n- diode structures. It has been successfully used to visualize the space charge region (SCR) at the p-n- junction and its widening into the n- drift layer, which allowed to reveal dark lines with discernibly vertical orientation assigned to threading dislocations (TDs). In these devices, also EBIC inhomogeneities at the top n + /p-body junction have been detected. Proper formation of the lateral isolation by Nitrogen implantation has been proved by a sharp drop in the EBIC signal at the border between the active and the N-implanted areas.
半垂直GaN功率二极管的横断面SEM-EBIC分析
利用电子束感应电流(EBIC)技术研究了半垂直氮化镓(GaN) p-n和n: -p-n二极管结构截面上的耗尽区。它已经成功地用于可视化p-n结的空间电荷区(SCR)及其扩展到n漂移层,这允许揭示具有可识别的垂直方向的暗线,分配给螺纹位错(td)。在这些器件中,还检测到顶部n + /p体结处的EBIC不均匀性。在激活区和氮注入区交界处,EBIC信号急剧下降,证明了氮注入对侧隔离的正确形成。
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