J. Priesol, A. Šatka, M. Borga, A. Minj, B. Bakeroot, K. Geens
{"title":"Cross-sectional SEM-EBIC analysis of semi-vertical GaN power diodes","authors":"J. Priesol, A. Šatka, M. Borga, A. Minj, B. Bakeroot, K. Geens","doi":"10.1109/ASDAM55965.2022.9966747","DOIUrl":null,"url":null,"abstract":"Electron beam induced current (EBIC) technique has been used to study depletion regions at the cross-sections of semi-vertical Gallium Nitride (GaN) p-n-and n: -p-n- diode structures. It has been successfully used to visualize the space charge region (SCR) at the p-n- junction and its widening into the n- drift layer, which allowed to reveal dark lines with discernibly vertical orientation assigned to threading dislocations (TDs). In these devices, also EBIC inhomogeneities at the top n + /p-body junction have been detected. Proper formation of the lateral isolation by Nitrogen implantation has been proved by a sharp drop in the EBIC signal at the border between the active and the N-implanted areas.","PeriodicalId":148302,"journal":{"name":"2022 14th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-10-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 14th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASDAM55965.2022.9966747","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Electron beam induced current (EBIC) technique has been used to study depletion regions at the cross-sections of semi-vertical Gallium Nitride (GaN) p-n-and n: -p-n- diode structures. It has been successfully used to visualize the space charge region (SCR) at the p-n- junction and its widening into the n- drift layer, which allowed to reveal dark lines with discernibly vertical orientation assigned to threading dislocations (TDs). In these devices, also EBIC inhomogeneities at the top n + /p-body junction have been detected. Proper formation of the lateral isolation by Nitrogen implantation has been proved by a sharp drop in the EBIC signal at the border between the active and the N-implanted areas.