Performance analysis of a novel hetero-junction tunnel FET based SRAM at 0.3V supply voltage

Mohd Kashif Zia Ansari, S. Ahish, D. Sharma, M. H. Vasantha, Y. B. N. Kumar
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Abstract

In this paper, the stability/performance of the conventional SRAM cell architectures have been demonstrated using a novel hetero-junction double gate tunnel FET (H-DGTFET) device at 15 nm technology node. This device has improved ON-current (ION) because of the decrease in width of the depletion region due to a highly doped layer placed in the channel near the source-channel junction. It results in an improved ION /IOFF ratio, consuming significantly less amount of static power. The conventional 6T and 8T SRAM architectures have been implemented using this novel H-DGTFET operating at low supply voltage of 0.3 V. The performance of the 6T and 8T SRAM cells have been analyzed in terms of hold, read & write SNMs and total average power consumption. The read SNM for 6T and 8T SRAM cells have been found to be 54 mV and 69 mV respectively; hold and write SNM for 6T are 90 mV and 103 mV respectively. Total average power consumption for 6T and 8T SRAM cells are 2.13 μW and 2.68 μW respectively in one cycle consisting of two reads and one write “0”/write “1” operations.
一种新型异质结隧道场效应管SRAM在0.3V供电电压下的性能分析
本文利用一种新型的异质结双栅隧道场效应晶体管(H-DGTFET)器件在15nm技术节点上证明了传统SRAM电池结构的稳定性/性能。该器件改善了on电流(ION),因为在源-通道交界处附近的通道中放置了高掺杂层,从而减少了耗尽区的宽度。它可以提高ION /IOFF比率,大大减少静态功率的消耗。传统的6T和8T SRAM架构已经使用这种新颖的H-DGTFET在0.3 V的低电源电压下实现。从保持、读写snm和总平均功耗方面分析了6T和8T SRAM单元的性能。6T和8T SRAM电池的读SNM分别为54 mV和69 mV;6T的持有和写入SNM分别为90 mV和103 mV。6T和8T SRAM单元在一个由两次读和一次写“0”/写“1”操作组成的周期内的总平均功耗分别为2.13 μW和2.68 μW。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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