Origin and optimization of large dark current increase in InGaAs/InP APD

J. Wen, W. J. Wang, W. D. Hu, N. Li, Z. Li, W. Lu
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引用次数: 2

Abstract

Dark current of our InGaAs/InP planar SAGCM APD is simulated. Activation energy Ea obtained from the I-V test under temperature range of 240K~300K is cooperated in the simulation. Two origins of the dark current increasi of over one order of magnitude from the punchthrouth voltage to the breakthrough voltage are analyzed. Our results provide two critical points to reduce the dark current of an InGaAs/InP APD operated under the linear operation mode.
InGaAs/InP APD中大暗电流增加的来源及优化
模拟了InGaAs/InP平面SAGCM APD的暗电流。结合温度范围为240K~300K的I-V试验得到的活化能Ea进行模拟。分析了从穿透电压到突破电压暗电流增加超过一个数量级的两个原因。我们的研究结果提供了减小线性工作模式下InGaAs/InP APD暗电流的两个关键点。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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