{"title":"Existence and stability of a capillary free surface appearing in dewetted Bridgman process. I.","authors":"A. Balint, S. Balint","doi":"10.1063/5.0002151","DOIUrl":null,"url":null,"abstract":"This paper present six theoretical results concerning the existence and static stability of a capillary free surface appearing in a dewetted Bridgman crystal growth technique. The results are obtained in an axis symmetric 2D model for semiconductors for which the sum of wetting angle and growth angle is less than 180. Numerical results are presented in case of InSb semiconductor growth. The reported results can help, the practical crystal growers, in better understanding the dependence of the free surface shape and size on the pressure difference across the free surface and prepare the appropriate seed size, and thermal conditions before seeding the growth process.","PeriodicalId":438372,"journal":{"name":"TIM 19 PHYSICS CONFERENCE","volume":"81 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"TIM 19 PHYSICS CONFERENCE","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/5.0002151","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This paper present six theoretical results concerning the existence and static stability of a capillary free surface appearing in a dewetted Bridgman crystal growth technique. The results are obtained in an axis symmetric 2D model for semiconductors for which the sum of wetting angle and growth angle is less than 180. Numerical results are presented in case of InSb semiconductor growth. The reported results can help, the practical crystal growers, in better understanding the dependence of the free surface shape and size on the pressure difference across the free surface and prepare the appropriate seed size, and thermal conditions before seeding the growth process.