Residual Layer Distribution on Embossing Process for Photonic Devices

C. Choi, M. W. Lee, J. Sung, Bo-Soon Kim, Seung-Gol Lee, B. O
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Abstract

We report on the behavior and effect of the residual layer left on the substrate after embossing process for the fabrication of photonic devices. The PDMS material was used as mold, and thermal and UV curable polymers was adapted for the fabrication of demultiplexer and optical power splitter, respectively.
光子器件压印过程中残余层分布
本文报道了在光子器件制造过程中,压印后在衬底上留下的残余层的行为和影响。以PDMS材料为模具,采用热固化聚合物和光固化聚合物分别制备解复用器和光功率分配器。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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