Fabrication and Characterization of Two-Dimensional Photonic Crystal on Silicon by Efficient Methods

3rd IEEE International Conference on Group IV Photonics, 2006. Pub Date : 2006-10-09 DOI:10.1109/GROUP4.2006.1708168

Xingsheng Xu, Chunxia Wang, Fang Li, G. Xiong, Yuliang Liu, Hongda Chen

引用次数: 0

Abstract

Two-dimensional photonic crystals working in near infrared region are fabricated into silicon-on-insulator wafer by 248-nm deep UV lithography. We present an efficient way to measure the photonic crystal waveguide's light transmission spectra at given polarization states

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硅基二维光子晶体的高效制备与表征

采用248nm深紫外光刻技术制备了工作在近红外区的二维光子晶体。提出了一种测量光子晶体波导在给定偏振态下透射光谱的有效方法

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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3rd IEEE International Conference on Group IV Photonics, 2006.

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