A new approach to statistical process control in a test environment: the empirical delta control chart

S. Weisbrod, C. S. McFarland
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引用次数: 1

Abstract

Past attempts at Harris Semiconductor to control the test measurements process and their inherent weaknesses are discussed. The empirical delta control chart (ED-chart), along with its corresponding control unit/die philosophy, is introduced as an alternative toward controlling the semiconductor wafer and package test environments. Only one control chart (per test parameter tracked) is required for all control units and die, as opposed to one chart for each unit or die. To add to this, no modification of the control limits is required when new control devices are introduced to the system. Their low chart count and their ability to stay with one set of charts solves many of the maintenance problems typically associated with statistical process control (SPC) in a test area. The permanent nature of an ED-chart representing one continuing standard facilitates the idea of continuous improvement. ED-charts emphasize the measurement aspect of a test area-where the ability to test accurately and repeatability over time are the goal.<>
测试环境中统计过程控制的新方法:经验δ控制图
讨论了哈里斯半导体公司过去控制测试测量过程的尝试及其固有的弱点。本文介绍了经验增量控制图(ED-chart)及其相应的控制单元/模具原理,作为控制半导体晶圆和封装测试环境的替代方法。所有控制单元和模具只需要一个控制图(每个跟踪的测试参数),而不是每个单元或模具一个控制图。除此之外,当向系统引入新的控制装置时,不需要修改控制极限。他们的低图表数量和保持一组图表的能力解决了许多通常与测试区域的统计过程控制(SPC)相关的维护问题。ed图表代表一个持续的标准,其永久性有助于持续改进的理念。ed图强调测试区域的测量方面——在这里,随着时间的推移,准确测试的能力和可重复性是目标。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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