Engineering of thin crystal layers grown by pulsed laser deposition

J. Grant-Jacob, S. Beecher, Tina L. Parsonage, P. Hua, J. Mackenzie, D. Shepherd, R. Eason
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引用次数: 3

Abstract

Pulsed laser deposition (PLD) is an epitaxial growth technique capable of growing planar layers of crystals with thicknesses up to several 10's of microns. Crystal layers can be grown sequentially without intermediate sample conditioning allowing complicated structures, such as laser-active double-clad designs, to be routinely fabricated. We have recently demonstrated output powers of more than 16W and slope efficiencies of 70% for diode-bar end-pumped planar waveguide oscillators based on PLD Yb:YAG grown on YAG substrates. Here, we present our initial results on varying the growth conditions to tailor the stoichiometry, refractive index, and spectroscopic properties of PLD grown layers. This fine level of control, made possible by this technique, opens the way to bespoke and unique gain media for novel amplifier and lasers designs.
脉冲激光沉积生长的薄晶体层工程
脉冲激光沉积(PLD)是一种外延生长技术,能够生长厚度达几十微米的平面晶体层。晶体层可以在没有中间样品调理的情况下依次生长,从而允许常规制造复杂结构,例如激光主动双包层设计。我们最近展示了基于生长在YAG衬底上的PLD Yb:YAG的二极管棒端泵浦平面波导振荡器的输出功率超过16W,斜率效率为70%。在这里,我们展示了我们关于改变生长条件来定制PLD生长层的化学计量学、折射率和光谱特性的初步结果。这种精细的控制水平,使这种技术成为可能,为新型放大器和激光器设计开辟了定制和独特增益介质的道路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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