Temperature-Dependent Electrical Characterization of Multiferroic BiFeO3 Thin Films

D. Hitchen, Siddhartha Ghosh
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Abstract

The polarization hysteresis and current leakage characteristics of bismuth ferrite, BiFeO 3  (BFO) thin films deposited by pulsed laser deposition was measured while varying the temperature from 80 - 300 K in increments of 10 K, to determine the feasibility of BFO for capacitive applications in memory storage devices. Data is compared to the performance of prototypic ferroelectric barium strontium titanate, Ba x Sr 1-x TiO 3  (BST) under similar conditions. Finding contacts on the BFO samples that exhibited acceptable dielectric properties was challenging; and once identified, the polarization characteristics between them varied greatly. However, the non-uniformity among the contact points within each sample suggests that either the samples were defective (by contamination or growth process), or that the deposition process of the contacts may have undermined the functionality of the devices. Subjected to increasing temperatures, BFO's polarization improved, and though its polarizability was shown to be inferior to BST, the dielectric loss was less.
多铁BiFeO3薄膜的温度依赖性电学特性
在80 ~ 300 K温度范围内,以10 K为增量,测量了脉冲激光沉积的铋铁氧体bifeo3 (BFO)薄膜的极化滞后和漏电流特性,以确定BFO在存储器件电容性应用的可行性。数据与原型铁电钛酸钡锶钡在相似条件下的性能进行了比较。在BFO样品上寻找具有可接受介电性能的触点是具有挑战性的;一旦确定,它们之间的极化特性差异很大。然而,每个样品中接触点的不均匀性表明,要么是样品有缺陷(污染或生长过程),要么是接触点的沉积过程可能破坏了器件的功能。随着温度的升高,BFO的极化性能得到改善,极化率虽然不如BST,但介质损耗更小。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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