D. Vasilache, A. Nicoloiu, G. Boldeiu, I. Zdru, T. Kostopoulos, M. Nedelcu, A. Stavrinidis, C. Nastase, G. Stavrinidis, G. Konstantinidis, A. Dinescu, A. Müller
{"title":"Development of high frequency SAW devices devoted for pressure sensing","authors":"D. Vasilache, A. Nicoloiu, G. Boldeiu, I. Zdru, T. Kostopoulos, M. Nedelcu, A. Stavrinidis, C. Nastase, G. Stavrinidis, G. Konstantinidis, A. Dinescu, A. Müller","doi":"10.1109/CAS56377.2022.9934404","DOIUrl":null,"url":null,"abstract":"The paper presents a successful demonstration of 0-level packaged SAW pressure sensors developed on GaN/Si thin membranes (1.3 μ m/ 10 μ m) with a backside Mo metallization (30 nm). FEM simulations were performed in order to predict the mechanical behavior of the membrane and of the package. One-port SAW devices having IDTs of 120 nm width were fabricated bye-beam nanolithography. High values of the sensitivity (1102 kHz/Bar) and of the pressure coefficient of frequency (126 ppm/Bar) have been obtained due to the very high frequency operation (8.7 GHz) of the SAW. An insignificant dropping of these values was obtained after the bonding of the capsule.","PeriodicalId":380138,"journal":{"name":"2022 International Semiconductor Conference (CAS)","volume":"25 1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-10-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 International Semiconductor Conference (CAS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CAS56377.2022.9934404","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The paper presents a successful demonstration of 0-level packaged SAW pressure sensors developed on GaN/Si thin membranes (1.3 μ m/ 10 μ m) with a backside Mo metallization (30 nm). FEM simulations were performed in order to predict the mechanical behavior of the membrane and of the package. One-port SAW devices having IDTs of 120 nm width were fabricated bye-beam nanolithography. High values of the sensitivity (1102 kHz/Bar) and of the pressure coefficient of frequency (126 ppm/Bar) have been obtained due to the very high frequency operation (8.7 GHz) of the SAW. An insignificant dropping of these values was obtained after the bonding of the capsule.