An on-chip characterizing system for within-die delay variation measurement of individual standard cells in 65-nm CMOS

Xin Zhang, K. Ishida, M. Takamiya, T. Sakurai
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引用次数: 11

Abstract

New characterizing system for within-die delay variations of individual standard cells is presented. The proposed characterizing system is able to measure rising and falling delay variations separately by directly measuring the input and output waveforms of individual gate using an on-chip sampling oscilloscope in 65nm CMOS process. 7 types of standard cells are measured with 60 DUT's for each type. Thanks to the proposed system, a relationship between the rising and falling delay variations and the active area of the standard cells is experimentally shown for the first time.
一种用于测量65nm CMOS中单个标准单元的芯片内延迟变化的片上表征系统
提出了一种新的模内延迟变化的表征系统。所提出的表征系统采用65nm CMOS工艺的片上采样示波器,通过直接测量单个栅极的输入输出波形,能够分别测量上升和下降的延迟变化。测量7种标准细胞,每种细胞用60个DUT。利用该系统,首次通过实验证明了延时的上升和下降变化与标准单元的活动面积之间的关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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