{"title":"Electron-Beam Lithography Techniques for Micro- and Nano-scale Surface Structure Current Injection Lasers","authors":"G. DeRose, Lin Zhu, J. Poon, A. Yariv, A. Scherer","doi":"10.1109/CLEO.2007.4452835","DOIUrl":null,"url":null,"abstract":"We demonstrate nanoscale patterning and overlay of two-dimensional gratings and waveguides with accuracy better than 45 nm using electron-beam lithography for surface structure lasers with large areas.","PeriodicalId":193475,"journal":{"name":"2007 Conference on Lasers and Electro-Optics (CLEO)","volume":"2019 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2007-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2007 Conference on Lasers and Electro-Optics (CLEO)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEO.2007.4452835","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
We demonstrate nanoscale patterning and overlay of two-dimensional gratings and waveguides with accuracy better than 45 nm using electron-beam lithography for surface structure lasers with large areas.