Investigation of phase shift of holographic gratings in photorefractive materials

M. Zha, P. Amrhein, P. Günter
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Abstract

The fundamental processes occurring during the writing of phase gratings in photorefractive materials have been studied extensively in the past 1,2. Due to different mechanisms of carrier transportation these holograms may be phase shifted with respect to the interference pattern. This phase shift is of fundamental significance for the understanding of the mechanism of the photorefractive effect and for applications. We present a novel method for measuring the phase shift and some experimental results.
光折变材料中全息光栅相移的研究
在过去1,2中,对光折变材料中相位光栅写入的基本过程进行了广泛的研究。由于载流子传输的不同机制,这些全息图可能相对于干涉图发生相移。这种相移对理解光折变效应的机理和应用具有重要意义。我们提出了一种测量相移的新方法和一些实验结果。
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