Nondestructive measurement of layer thickness in double heterostructures by x-ray double crystal diffraction

Thin Film Physics and Applications Pub Date : 1998-02-20 DOI:10.1117/12.300707

Y. Qu, Xueqian Li, Xiaowei Song, Xingde Zhang, Li-ding Wang, Xiping Qie

引用次数: 0

Abstract

In this paper we introduce a method of measuring thin layer thickness using a sandwich structure of the In0.43Ga0.57As0.15P0.85/In0.13Ga0.87As0.75P0.25/In0.43Ga0.57As0.15P0.85 DH with the interference fringes in rocking curve by x-ray double-crystal diffraction.

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用x射线双晶衍射法无损测量双异质结构层厚

本文介绍了一种利用x射线双晶衍射方法，利用夹心结构的In0.43Ga0.57As0.15P0.85/In0.13Ga0.87As0.75P0.25/In0.43Ga0.57As0.15P0.85 DH测量薄层厚度的方法。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Thin Film Physics and Applications

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