A two-dimensional model for the potential distribution and depletion layer width of the short gate-length GaAs MESFET's

S. Khemissi, C. Azizi
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引用次数: 1

Abstract

A new two-dimensional analytical model for the potential distribution and depletion-layer width for the short-gate GaAs MESFET's has been presented in this paper. The solution of the two-dimensional Poisson's equation has been considered as the superposition of the solution of one-dimensional Poisson's equation in the lateral direction and the two-dimensional Laplace equation with suitable boundary conditions. The remarkable feature of the proposed model is that, in the hand the simplicity of the mathematical expressions and in the other hand the acceptable distribution for the potential and charge in the channel. The numerical results have been presented for the potential distribution and depletion-layer width for different parameters such as the drain-source voltage, gate-length, active-layer thickness and doped profile. It is observed that for the GaAs MESFET's, as the gate-length is decreased, the 2-D potential is increased and this demonstrates the importance of the two-dimensional analysis for the short-gate devices.
建立了短栅长GaAs MESFET的势分布和耗尽层宽度的二维模型
本文提出了一种新的二维解析模型,用于计算短栅GaAs MESFET的电势分布和耗尽层宽度。二维泊松方程的解被认为是一维泊松方程在横向方向上的解与具有适当边界条件的二维拉普拉斯方程解的叠加。该模型的显著特点是,一方面数学表达式的简单性,另一方面通道中电位和电荷的可接受分布。给出了在漏源电压、栅极长度、有源层厚度和掺杂剖面等不同参数下的电势分布和耗尽层宽度的数值计算结果。我们观察到,对于GaAs MESFET,随着栅极长度的减小,二维电位增加,这表明二维分析对短栅极器件的重要性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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