Seki Kim, Hyongmin Lee, Yongjin Lee, Dongha Lee, Byeongbae Lee, Jahoon Jin, Susie Kim, Miri Noh, K. Kang, Sangho Kim, Takahiro Nomiyama, Ji-Seon Paek, Jongwoo Lee
{"title":"A 3nm GAAFET Analog Assisted Digital LDO with High Current Density for Dynamic Voltage Scaling Mobile Applications","authors":"Seki Kim, Hyongmin Lee, Yongjin Lee, Dongha Lee, Byeongbae Lee, Jahoon Jin, Susie Kim, Miri Noh, K. Kang, Sangho Kim, Takahiro Nomiyama, Ji-Seon Paek, Jongwoo Lee","doi":"10.1109/vlsitechnologyandcir46769.2022.9830252","DOIUrl":null,"url":null,"abstract":"This paper presents an analog assisted digital LDO achieving high current density and fast response characteristic. A current comparator based control method enables over 10x ratio of digital current over analog current for high current density regardless of PVT condition. The proposed LDO in 3nm GAAFET CMOS technology demonstrated current density of 34.15A/mm2 and fast transient characteristic of 38mV droop at 1A/1ns load current condition.","PeriodicalId":332454,"journal":{"name":"2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2022-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/vlsitechnologyandcir46769.2022.9830252","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
This paper presents an analog assisted digital LDO achieving high current density and fast response characteristic. A current comparator based control method enables over 10x ratio of digital current over analog current for high current density regardless of PVT condition. The proposed LDO in 3nm GAAFET CMOS technology demonstrated current density of 34.15A/mm2 and fast transient characteristic of 38mV droop at 1A/1ns load current condition.