Lithography, Plasmonics and Sub-wavelength Aperture Exposure Technology

2007 Conference on Lasers and Electro-Optics (CLEO) Pub Date : 2007-12-10 DOI:10.1116/1.2812524

Y. Ngu, M. Peckerar, Xiaoping Liu, M. Dagenais, M. Messina, J. Barry

引用次数: 4

Abstract

We report enhanced transmission of 250 nm radiation by sub-wavelength square aperture arrays on silver and demonstrate its use in optical lithography with far- reduced number of addressed pixels to produce very good edge acuity.

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光刻、等离子体和亚波长光圈曝光技术

我们报告了亚波长方形孔径阵列在银上增强250nm辐射的传输，并演示了其在光学光刻中的应用，其寻址像素的数量大大减少，从而产生非常好的边缘敏锐度。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

2007 Conference on Lasers and Electro-Optics (CLEO)

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