A novel TLP bonding based on sub-micron Ga particles

S. Lin, Hseng-ming Liao, Che-yu Yeh, Chih-han Yang
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Abstract

In recent years, electronic devices used in our ordinary life become powerful and multifunctional, such as virtual reality (VR), internet of things (IoT), also the electrical vehicle. 3D IC and wide bandgap (WBG) semiconductor packaging are one of the most notable technologies in electronic packaging industries [1]–[3]. However, Conventional packaging technologies are gradually unable to meet the requirements of 3D IC or high-power devices operated in extremely harsh environments. In our previous work, we proposed a novel approach based on a transient liquid phase (TLP) bonding for forming face-centered cubic solid-solution joints without the formation of intermetallic compounds. A trace amount of gallium (Ga) and nickel (Ni) in an under-bump-metallurgy (UBM) process at 300°C for 24 h with high-strength and excellent thermal stability. In this study, due to the high surface tension of liquid Ga and the long time it takes to form the bonding joints, liquid Ga was replaced with Ga-based submicron particles (SMPs) by a sonochemical process. With Ga-based paste and Ni UBM, high-strength, thermally stable, and low resistance Cu-to-Cu bonding joints can be fabricated at a relatively low temperature and short bonding time comparing to the process reported in our previous work. The industrial application of Ga-based SMPs was conclusively demonstrated by a series of evaluations of Ga-based SMPs and Cu-to-Cu bonding joints.
基于亚微米Ga粒子的新型TLP键合
近年来,我们日常生活中使用的电子设备变得强大和多功能,例如虚拟现实(VR),物联网(IoT),以及电动汽车。3D集成电路和宽带隙(WBG)半导体封装是电子封装行业最引人注目的技术之一。然而,传统的封装技术逐渐无法满足在极端恶劣环境下运行的3D IC或大功率器件的要求。在我们之前的工作中,我们提出了一种基于瞬态液相(TLP)键合的新方法,用于形成面心立方固溶接头而不形成金属间化合物。在300°C下碰撞冶金(UBM)工艺中,以高强度和优异的热稳定性制备了微量镓(Ga)和镍(Ni)。在本研究中,由于液态Ga的高表面张力和形成键合接头所需的时间较长,通过声化学工艺将液态Ga替换为基于Ga的亚微米颗粒(SMPs)。与我们之前报道的工艺相比,使用ga基浆料和Ni UBM,可以在相对较低的温度和较短的键合时间内制造高强度,热稳定性和低电阻的cu - cu键合接头。通过对ga基SMPs和Cu-to-Cu键合接头的一系列评价,最终证明了ga基SMPs的工业应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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