Third harmonic (TH) generation: a tool to study dielectric material properties near the laser induced damage threshold (LIDT)

Abstract

Third harmonic generation (THG) in dielectric films with femtosecond laser pulses is used to study properties of dielectric thin films and stacks thereof below and above the 1-on-1 laser damage threshold. Deviations from the ideal cubic relationship between third-harmonic signal and incident fundamental fluence are a result of several fundamental processes. Their relative contributions are assessed by comparing results from LIDT and conversion efficiency measurements as well as beam profile and pump-probe studies.