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Development Of High Resolution Reactive Ion Etching Of II-VI Semiconductors Using CH4/H2

LEOS 1991 Summer Topical Meetings on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices. Photonics and Optoelectronics Pub Date : 1900-01-01 DOI:10.1109/LEOSST.1991.639023
M. Foad, C. Dunscomb, R. Williams, C. Wilkinson
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利用CH4/H2制备II-VI半导体的高分辨率反应离子刻蚀研究
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LEOS 1991 Summer Topical Meetings on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices. Photonics and Optoelectronics
LEOS 1991 Summer Topical Meetings on Epitaxial Materials and In-Situ Processing for Optoelectronic Devices. Photonics and Optoelectronics
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