EUV and SXR multilayer coatings in solar physics: from the current aspects to the future perspectives

A. Corso, M. Pelizzo, D. Spiga
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Abstract

Multilayer coatings (MLs) are widely employed for the development of EUV and SXR space-based instrumentation for solar plasma diagnostics since they are the only viable solution for the realization of high-efficiency normal incidence mirrors in this spectral range. Almost all the current missions adopt standard periodic MLs whose reflectance is usually characterized by a high but narrow spectral band. However, future challenges in solar plasma diagnostics require instrumentation with increasingly effective areas and capable of simultaneously observing multiple spectral lines. Fortunately, recent advancement in MLs technology has made the development of new solutions which improve the standard performance achieved so far. For Instance, the possibility to deposit non-periodic stacks with high repeatability and reliability enables the manufacturing of mirrors with either multi-band or broad-band high efficiency. In this work, a study of non-periodic multilayer coatings for the EUV/SXR range is presented, discussing some future perspectives for the next-generation missions.
EUV和SXR多层涂层在太阳物理中的应用:从目前的角度到未来的展望
多层涂层(MLs)被广泛应用于用于太阳等离子体诊断的EUV和SXR天基仪器的开发,因为它们是在该光谱范围内实现高效正入射反射镜的唯一可行方案。目前几乎所有的任务都采用了标准的周期性MLs,其反射率通常具有高而窄的光谱带。然而,太阳等离子体诊断的未来挑战需要仪器的有效面积越来越大,并且能够同时观测多个谱线。幸运的是,最近MLs技术的进步已经开发出新的解决方案,提高了迄今为止所达到的标准性能。例如,沉积具有高重复性和可靠性的非周期性堆叠的可能性使得制造具有多波段或宽带高效率的反射镜成为可能。在这项工作中,介绍了用于EUV/SXR范围的非周期性多层涂层的研究,讨论了下一代任务的一些未来前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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