Santos Mayo, J. Lowney, Peter Roitman, Donald B. Novotny
{"title":"Persistent photoconductivity in SIMOX films","authors":"Santos Mayo, J. Lowney, Peter Roitman, Donald B. Novotny","doi":"10.1109/SOSSOI.1990.145759","DOIUrl":null,"url":null,"abstract":"Photoinduced transient spectroscopy (PITS) was used to measure the persistent photoconductive (PPC) response in film resistors fabricated on two different commercial n-type SIMOX (separation by implantation of oxygen) wafers. A broadband, single-shot, flashlamp-pumped dye-laser pulse was used to photoexcite interband electrons in the film, and the decay of the induced excess carrier population was measured at temperatures in the 60-220 K range. The post-illumination conductivity transients observed show PPC signals exhibiting a nonexponential character. They were recorded for periods of time up to 30 s at constant temperature. Presented are the excess conductivity in SIMOX film annealed in nitrogen at 1300 degrees C for 6 h and the hole-trap volume density at the conductive-film-buried-silicon interface.<<ETX>>","PeriodicalId":344373,"journal":{"name":"1990 IEEE SOS/SOI Technology Conference. Proceedings","volume":"10 27 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1990 IEEE SOS/SOI Technology Conference. Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOSSOI.1990.145759","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Photoinduced transient spectroscopy (PITS) was used to measure the persistent photoconductive (PPC) response in film resistors fabricated on two different commercial n-type SIMOX (separation by implantation of oxygen) wafers. A broadband, single-shot, flashlamp-pumped dye-laser pulse was used to photoexcite interband electrons in the film, and the decay of the induced excess carrier population was measured at temperatures in the 60-220 K range. The post-illumination conductivity transients observed show PPC signals exhibiting a nonexponential character. They were recorded for periods of time up to 30 s at constant temperature. Presented are the excess conductivity in SIMOX film annealed in nitrogen at 1300 degrees C for 6 h and the hole-trap volume density at the conductive-film-buried-silicon interface.<>