Optimization of a gas jet-type Z-pinch discharge EUV light source

Abstract

A high repetitive, compact and low-debris Xenon Z-pinch discharge system has been designed and fabricated as an EUV light source, in which a newly developed gas jet-type Z-pinch source is used. The discharge head has a coaxial double nozzle and a diffuser. Xenon Z-pinch plasma that emits EUV light is produced between the inner nozzle and the corresponding diffuser. An annular shell of a He gas curtain produced by the outer nozzle is specially designed for shielding the debris and suppressing the inner gas expansion. We have succeeded in generating EUV emitting plasma of 0.14 mm FWHM diameter and 0.80 mm FWHM length. We have also developed a new pulse power supply system, which has two magnetic pulse compression stages to achieve higher discharge current