Synthesis and Luminescent Properties of Silicon Nanocrystals

A. Coyopol-Solís, T. Diaz-Becerril, G. G. Salgado, S. A. Cabanas-Tay, L. Palacios-Huerta, A. Morales-Sánchez
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Abstract

Nowadays, study of silicon-based visible light-emitting devices has increased due to large-scale microelectronic integration. Since then different physical and chemical processes have been performed to convert bulk silicon (Si) into a light-emitting material. From discovery of Photoluminescence (PL) in porous Silicon by Canham, a new field of research was opened in optical properties of the Si nanocrystals (Si-NCs) embedded in a dielectric matrix, such as SRO (silicon-rich oxide) and SRN (silicon-rich nitride). In this respect, SRO films obtained by sputtering technique have proved to be an option for light-emitting capacitors (LECs). For the synthesis of SRO films, growth parameters should be considered; Si-excess, growth temperature and annealing temperature. Such parameters affect generation of radiative defects, distribution of Si-NCs and luminescent properties. In this chapter, we report synthesis, structural and luminescent properties of SRO monolayers and SRO/SiO2 multilayers (MLs) obtained by sputtering technique modifying Si-excess, thickness and thermal treatments.
硅纳米晶体的合成及其发光性能
目前,由于大规模微电子集成,硅基可见发光器件的研究日益增多。从那时起,不同的物理和化学过程被用来将大块硅(Si)转化为发光材料。从Canham在多孔硅中发现光致发光(PL)开始,对嵌入在介电基质中的硅纳米晶体(Si- ncs)的光学性质的研究开辟了一个新的领域,如SRO(富硅氧化物)和SRN(富硅氮化物)。在这方面,通过溅射技术获得的SRO薄膜已被证明是发光电容器(LECs)的一种选择。对于SRO薄膜的合成,需要考虑生长参数;硅过量,生长温度和退火温度。这些参数影响了辐射缺陷的产生、Si-NCs的分布和发光性能。在本章中,我们报道了SRO单层和SRO/SiO2多层膜(MLs)的合成、结构和发光性能。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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