High Current, Metal Vapor Vacuum Arc (mevva) Ion Source

P. Greene, M. Krishnan
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Abstract

A Metal Vapor Vacuum Arc (MEVVA) which has been operated at currents from 4 to 68 kA and current densities up to 24 kA/cm{sup 2} is under study at Science Research Laboratory (SRL). The MEVVA plasma is formed by drawing a low-voltage (< 2 kV) arc from a metal cathode to a transparent anode. A dense, highly ionized and nearly current free plasma streams past the anode and is confined and guided in a magnetic field. The SRL MEVVA is under development as a high density (n{sub i} {approximately} 10{sup 16} cm{sup {minus}3}) plasma source for use as imploding loads on high current, z-pinch x-ray simulators. The density of the MEVVA plasma has been measured to be {approximately} 10{sup 15} cm{sup {minus}3} in Ti and Cu ion plasmas with current densities at the cathode of {approximately} 10 kA/cm{sup 2}. Studies of discharges at higher current densities are presently under way. Data presenting the scaling of the ion density and total ion production with the discharge current over a wide range of currents will be presented. As a possible method to increase the plasma density, the effects of guiding the plasma into a converging magnetic nozzle are being studied. The resultsmore » of these experiments will be presented as well as data on the confinement of a non-converging magnetic field.« less
高电流,金属蒸气真空电弧(mevva)离子源
科学研究实验室正在研究一种金属蒸气真空电弧(MEVVA),其工作电流为4至68千卡,电流密度高达24千卡/厘米{sup 2}。MEVVA等离子体是通过从金属阴极到透明阳极的低压(< 2 kV)电弧形成的。一个密集的、高度电离的、几乎自由的等离子体流过阳极,并在磁场中被限制和引导。SRL MEVVA正在作为高密度(n{下标i}{大约}10{sup 16} cm{sup{负}3})等离子体源开发,用于大电流、z夹点x射线模拟器的内爆负载。MEVVA等离子体的密度测量为{大约}10{sup 15} cm{sup{-}3},阴极电流密度为{大约}10 kA/cm{sup 2}。目前正在进行更高电流密度下的放电研究。数据显示离子密度和总离子产量的比例与放电电流在很宽的电流范围内将被提出。作为一种可能的提高等离子体密度的方法,研究了引导等离子体进入会聚磁喷嘴的效果。这些实验的更多结果将被介绍,以及关于非会聚磁场约束的数据。«少
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