Simulation of the depth of the melted layer on the surface of a semiconductor using JAVA cross-platform application

O. Galochkin, D. Uhryn, E.V. Vatamanitsa, I. Soltys
{"title":"Simulation of the depth of the melted layer on the surface of a semiconductor using JAVA cross-platform application","authors":"O. Galochkin, D. Uhryn, E.V. Vatamanitsa, I. Soltys","doi":"10.31649/1681-7893-2022-43-1-76-81","DOIUrl":null,"url":null,"abstract":"The paper describes a method for obtaining p-n transitions due to the laser recrystallization of the surface of CdTe semiconductor samples, as well as a software application developed in Java that allows the simulation of thermal processes at the boundary of the epitaxial layer-substrate with laser irradiation of the semiconductor surface. It allows to make predictions regarding the thickness of the melted layer, which will affect the parameters of the devices made on the basis of the obtained barrier layers. The theoretical modeling of the processes taking place at absorption of laser radiation by the surface layer of a semiconductor is carried out.","PeriodicalId":142101,"journal":{"name":"Optoelectronic information-power technologies","volume":"145 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-12-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optoelectronic information-power technologies","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.31649/1681-7893-2022-43-1-76-81","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

The paper describes a method for obtaining p-n transitions due to the laser recrystallization of the surface of CdTe semiconductor samples, as well as a software application developed in Java that allows the simulation of thermal processes at the boundary of the epitaxial layer-substrate with laser irradiation of the semiconductor surface. It allows to make predictions regarding the thickness of the melted layer, which will affect the parameters of the devices made on the basis of the obtained barrier layers. The theoretical modeling of the processes taking place at absorption of laser radiation by the surface layer of a semiconductor is carried out.
模拟半导体表面熔层深度的JAVA跨平台应用程序
本文描述了一种通过激光对CdTe半导体样品表面再结晶而获得p-n跃迁的方法,以及一个用Java开发的软件应用程序,该应用程序允许在半导体表面的激光照射下模拟外延层-衬底边界的热过程。它允许对熔化层的厚度进行预测,这将影响基于所获得的阻挡层制造的器件的参数。对半导体表面吸收激光辐射的过程进行了理论建模。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信