Influence of Te layer on CdTe thin films and their performance on CdS/CdTe solar cells

C. Hernández-Vásquez, M. Gonzalez-Trujillo, Lucero Alejandra Esquivel Méndez, J. Aguilar-Hernandez, M. Albor-Aguilera
{"title":"Influence of Te layer on CdTe thin films and their performance on CdS/CdTe solar cells","authors":"C. Hernández-Vásquez, M. Gonzalez-Trujillo, Lucero Alejandra Esquivel Méndez, J. Aguilar-Hernandez, M. Albor-Aguilera","doi":"10.47566/2021_syv34_1-210901","DOIUrl":null,"url":null,"abstract":"CdTe semiconductor is an absorbent material used in “tandem” photovoltaic solar cells. This material is commonly deposited by thermal evaporation presenting electrical resistivity values about of 105 W·cm to 109 W·cm. CdTe is applied in thin solar cells as p-type layer which is in contact with metal back electrode in solar cells. In the CdTe/metal junction a Schottky barrier exits; and small number of charge carriers have enough energy to get over the barrier and cross to the metal back contact. To solve part of this problem, nanostructured Te thin films were used as intermediate layers between CdTe and metal contact. Te layers whit different physical properties were deposited on CdS/CdTe structure by thermal evaporation employing different growth parameters. The electrical parameters of CdTe solar cells were influenced by p+ Te regions. p+ Te regions used as intermediate layer with large deposition time increases the FF and VOC values from 30% to 60% and 560 mV to 730 mV respectively. Also, the electrical resistivity is reduced from 106 W·cm to 103 W·cm. In this sense, Te region implemented as nanostructure allows to reduce the series resistance from 99 W to 20 W and increases the shunt resistance from 1445 W to 4424 W;  Te region as thin films demonstrated not be adequate.","PeriodicalId":423848,"journal":{"name":"Superficies y Vacío","volume":"60 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Superficies y Vacío","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.47566/2021_syv34_1-210901","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

CdTe semiconductor is an absorbent material used in “tandem” photovoltaic solar cells. This material is commonly deposited by thermal evaporation presenting electrical resistivity values about of 105 W·cm to 109 W·cm. CdTe is applied in thin solar cells as p-type layer which is in contact with metal back electrode in solar cells. In the CdTe/metal junction a Schottky barrier exits; and small number of charge carriers have enough energy to get over the barrier and cross to the metal back contact. To solve part of this problem, nanostructured Te thin films were used as intermediate layers between CdTe and metal contact. Te layers whit different physical properties were deposited on CdS/CdTe structure by thermal evaporation employing different growth parameters. The electrical parameters of CdTe solar cells were influenced by p+ Te regions. p+ Te regions used as intermediate layer with large deposition time increases the FF and VOC values from 30% to 60% and 560 mV to 730 mV respectively. Also, the electrical resistivity is reduced from 106 W·cm to 103 W·cm. In this sense, Te region implemented as nanostructure allows to reduce the series resistance from 99 W to 20 W and increases the shunt resistance from 1445 W to 4424 W;  Te region as thin films demonstrated not be adequate.
Te层对CdTe薄膜及其在CdS/CdTe太阳能电池上性能的影响
CdTe半导体是一种用于“串联”光伏太阳能电池的吸收材料。这种材料通常通过热蒸发沉积,其电阻率值约为105 W·cm至109 W·cm。CdTe作为p型层与金属背电极接触,应用于太阳能电池中。在CdTe/金属结中存在肖特基势垒;少数载流子有足够的能量越过障壁,到达金属背触点。为了解决这个问题,纳米结构的Te薄膜被用作CdTe和金属接触之间的中间层。采用不同生长参数的热蒸发方法在CdS/CdTe结构上沉积了具有不同物理性质的层。p+ Te区对CdTe太阳能电池的电学参数有影响。p+ Te区作为中间层,沉积时间长,使FF和VOC值分别从30%增加到60%,从560 mV增加到730 mV。电阻率由106 W·cm降低到103 W·cm。从这个意义上说,采用纳米结构实现的区域允许将串联电阻从99 W降低到20 W,并将并联电阻从1445 W增加到4424 W;该区域作为薄膜表现不充分。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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