In-vacuum work function measurement system

Abstract

We developed an apparatus to measure the work function using a field emission retarding potential (FERP) technique. In this paper, we describe the basics of FERP and the measurement procedures to determine the work function of indium tin oxide (ITO) and aluminum thin films, which are used as electrodes in a large number of Organic Electronic devices. The system developed allows for rapid screening of candidate materials and surface processes for appropriate engineering of device electronic properties.