EMI and switching time evolution for power RF LDMOS in chopper application after accelerated tests

M. Belaid, M. Tlig, J. Ben Hadj Slama
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Abstract

This paper deals a correlation of ElectroMagnetic Interference (EMI) evolution with the switching performance of power RF LDMOS (Radio Frequency Lateral Diffused Metal-Oxide-Semiconductor) devices applied to a series chopper. In addition their influences on the dynamic parameters are studied after various accelerated ageing tests (thermal and electrical). The response of these parameters and the switching waveform are described. The findings of experimental results are presented and discussed. Measurements show that important variations are obtained on the devices rise time. After ageing tests, the charge trapping in the gate oxide causes the modifications in the Miller capacity level and width result in an increase of the rise time and decreased the fall time, consequently an increase of the switching slosses.
功率射频LDMOS斩波应用的电磁干扰和开关时间演化
本文研究了应用于串联斩波器的功率射频LDMOS (Radio Frequency Lateral diffusion metal - oxide semiconductor,射频横向扩散金属氧化物半导体)器件的电磁干扰演化与开关性能的关系。此外,通过各种加速老化试验(热老化和电老化)研究了它们对动态参数的影响。描述了这些参数的响应和开关波形。给出了实验结果并进行了讨论。测量结果表明,器件的上升时间发生了重要的变化。经过老化试验,栅极氧化物中的电荷捕获引起米勒容量水平和宽度的变化,导致上升时间增加,下降时间减少,从而导致开关损失增加。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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