Tuning refractive index sensing properties of micro-cavity in-line Mach-Zehnder interferometer with plasma etching

M. Janik, M. Koba, W. Bock, M. Śmietana
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引用次数: 1

Abstract

This work presents an application of reactive ion etching (RIE) for an effective tuning of the spectral response and the refractive-index (RI) sensitivity of the micro-cavity in-line Mach-Zehnder interferometer (μIMZI). The μIMZIs were fabricated using femtosecond laser micromachining in a standard single-mode fiber as a form circular holes with a diameter of 54 μm. The application of RIE with SF6 and O2 used as reactive gas allows for an efficient and well-controlled etching of the fabricated structure. The process resulted in cleaning the bottom of the micro-cavity and smoothening of its sidewalls. In transmission measurements, the effect of the plasma processing was observed as an increase in both spectral depths of the minima and RI sensitivity of the structure, as well as improved wettability of the micro-cavity surface, which made the measurements faster and easier.
等离子体刻蚀微腔直线马赫-曾德尔干涉仪折射率传感特性的调谐
本文介绍了反应离子刻蚀(RIE)在微腔直列马赫-曾德尔干涉仪(μIMZI)光谱响应和折射率(RI)灵敏度的有效调谐中的应用。采用飞秒激光微加工技术在标准单模光纤中制备了直径为54 μm的圆孔μ imzi。应用RIE以SF6和O2作为反应气体,可以有效和良好地控制制造结构的蚀刻。该工艺清洗了微腔的底部,并使其侧壁光滑。在透射测量中,等离子体处理的效果是增加了最小值的光谱深度和结构的RI灵敏度,以及改善了微腔表面的润湿性,这使得测量更快,更容易。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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