Mechanical Properties and Microstructures after Abnormal Grain Growth in Electrodeposited Ni-W Alloys

I. Matsui, A. Watanabe, T. Uesugi, N. Omura, Y. Takigawa, Takahisa Yamamoto
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Abstract

The thermal stability of electrodeposited Ni-W alloys has been identified to be due to W segregation. Although a kinetic contribution has been recently proposed, namely, the formation of W-oxides at grain boundaries (GBs) by annealing, the formation mechanism is unclear. In this study, we annealed electrodeposited Ni-W alloys up to 600 °C; then, we examined the mechanical properties and microstructures to deeply understand the thermal stability of Ni-W alloys. Mechanical testing of annealed alloys demonstrated that the proof stress and hardness increased against the increase in annealing temperature in the range of 380-450 °C. At the mesoscale, microstructure observations revealed that the grain size was refined with increasing temperature from 390 to 450 °C. Finer-grained microstructures were maintained up to the annealing temperature of 520 °C. At the nanoscale, grain boundary structures were directly observed, and the chemistry was also demonstrated. These nanoscale analyses detected S segregation at GBs and triple junctions, whereas oxides and precipitates likely to affect grain growth were not identified. Our results and discussion indicate that grain refinements against an increase in the annealing temperature can be explained by the conventional relationship between the annealing temperature and nucleation number.
电沉积Ni-W合金异常晶粒生长后的力学性能和显微组织
电沉积Ni-W合金的热稳定性是由W偏析引起的。虽然最近提出了一种动力学贡献,即退火在晶界处形成w -氧化物(GBs),但形成机制尚不清楚。在本研究中,我们将电沉积Ni-W合金退火至600°C;然后,对Ni-W合金的力学性能和显微组织进行了研究,以深入了解其热稳定性。退火合金的力学性能测试表明,在380 ~ 450℃范围内,退火温度越高,合金的抗应力和硬度越高。在中尺度上,从390℃到450℃,随着温度的升高,晶粒尺寸逐渐细化。在520℃的退火温度下,仍能保持较细晶粒的组织。在纳米尺度上,直接观察到晶界结构,并证明了其化学性质。这些纳米级的分析检测到在GBs和三重结处的S偏析,而没有发现可能影响晶粒生长的氧化物和沉淀。我们的结果和讨论表明,随着退火温度的升高,晶粒细化可以用退火温度和成核数之间的常规关系来解释。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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