{"title":"Subwavelength grating waveguide-integrated athermal Mach-Zehnder interferometer with enhanced fabrication error tolerance and wide stable spectral range","authors":"P. Xing, Jaime Viegas","doi":"10.1117/12.2214101","DOIUrl":null,"url":null,"abstract":"We propose an athermal Mach-Zehnder interferometer (MZI) with a subwavelength grating waveguide implemented in one of the arms to increase its fabrication error tolerance. The design is demonstrated with a CMOS compatible fabrication. In this work we will discuss the design principles of the subwavelength grating, loss mechanism, fabrication procedure and experimental results obtained. The fabricated devices have a temperature sensitivity of less than 10 pm/K over a spectral range from 1.5μm to 1.64μm. Also, the fabricated devices have a stable performance within the aforementioned specifications even with fabrication linewidth variations from -20 nm to 40 nm.","PeriodicalId":122702,"journal":{"name":"SPIE OPTO","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-03-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE OPTO","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2214101","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5
Abstract
We propose an athermal Mach-Zehnder interferometer (MZI) with a subwavelength grating waveguide implemented in one of the arms to increase its fabrication error tolerance. The design is demonstrated with a CMOS compatible fabrication. In this work we will discuss the design principles of the subwavelength grating, loss mechanism, fabrication procedure and experimental results obtained. The fabricated devices have a temperature sensitivity of less than 10 pm/K over a spectral range from 1.5μm to 1.64μm. Also, the fabricated devices have a stable performance within the aforementioned specifications even with fabrication linewidth variations from -20 nm to 40 nm.