On-wafer differential noise figure and large signal measurements of low-noise amplifier

Yin-Cheng Chang, Shuw-Guann Lin, Hsien-Yuan Liao, H. Chiou, Y. Juang
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引用次数: 5

Abstract

An on-wafer measurement technique is proposed to characterize the differential noise figure (NF), 1-dB compression point (P1dB) and input third order intercept point (IP3) of low-noise amplifier (LNA). This work successfully extends Friis equation to the generalized two-port case by introducing true differential mode concept. The correlated differential NF is accurately obtained after de-embedding the noise contribution from the interconnections and external components. Details of equations and measurement procedure are reported in this work. A 2.6 GHz differential LNA was tested to demonstrate the feasibility of measurement and showed precise NF compared with other methods. A large signal measurement based on true differential mode stimulus with the same test bench was also performed and presented accurate results.
低噪声放大器的片上差分噪声图和大信号测量
提出了一种测量低噪声放大器(LNA)差分噪声系数(NF)、1 db压缩点(P1dB)和输入三阶截距点(IP3)的片上测量技术。本文通过引入真微分模态概念,成功地将Friis方程推广到广义双端口情况。在去嵌入互连和外部分量的噪声贡献后,可以准确地获得相关微分NF。本文详细介绍了方程和测量方法。对一种2.6 GHz差分LNA进行了测试,验证了测量的可行性,并与其他方法相比显示出精确的NF。在同一试验台进行了基于真差模刺激的大信号测量,得到了准确的结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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