{"title":"ESD latency effects in CMOS integrated circuits","authors":"W. Greason, Z. Kucerovsky, K. Chum","doi":"10.1109/IAS.1990.152287","DOIUrl":null,"url":null,"abstract":"Measurements were performed on two types of commercially available and custom-made CMOS integrated circuits to investigate the latent mode of failure due to ESD (electrostatic discharge). The current injection test method is used for both polarities of discharge. Test parameters studied include threshold failure, constant amplitude multiple stress, step stress, and the stress hardening effect. Statistical analyses of the results demonstrate the presence of latent failure in CMOS integrated circuits due to ESD. The work is used to further expand a charge injection model for latent failures.<<ETX>>","PeriodicalId":185839,"journal":{"name":"Conference Record of the 1990 IEEE Industry Applications Society Annual Meeting","volume":"2014 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Record of the 1990 IEEE Industry Applications Society Annual Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IAS.1990.152287","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
Measurements were performed on two types of commercially available and custom-made CMOS integrated circuits to investigate the latent mode of failure due to ESD (electrostatic discharge). The current injection test method is used for both polarities of discharge. Test parameters studied include threshold failure, constant amplitude multiple stress, step stress, and the stress hardening effect. Statistical analyses of the results demonstrate the presence of latent failure in CMOS integrated circuits due to ESD. The work is used to further expand a charge injection model for latent failures.<>