Simulation of spontaneous emission power on silicon based quantum dot with variation of light source and dot size

Yudhistira, F. Rahayu, Y. Darma
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Abstract

The spontaneous emission power of silicon-based quantum dot has been simulated. Using one-dimensional quantum dot approach on quantum box model, the transition of electrons from ground energy to a higher energy level (inter-band transitions) can be described by evaluating the time-dependent Schrödinger equation. By varying the dot size (1 nm, 2 nm, and 4 nm), different values of effective band-gap will be obtained. Using the perturbation theory, with dot size and light source variations, the power of the spontaneous emission can be obtained. With those variations, one kind of laser and an optimum dot size which can produce the highest spontaneous emission power can be acquired, that is by XeF laser radiation with 2 nm of quantum dot size.
硅基量子点随光源和点尺寸变化的自发发射功率模拟
模拟了硅基量子点的自发发射功率。利用量子盒模型上的一维量子点方法,电子从地能向更高能级的跃迁(带间跃迁)可以通过计算时间相关的Schrödinger方程来描述。通过改变网点尺寸(1 nm、2 nm和4 nm),可以获得不同的有效带隙值。利用微扰理论,可以得到随点尺寸和光源变化的自发发射功率。通过这些变化,可以获得一种能够产生最高自发发射功率的激光器和最佳点尺寸,即量子点尺寸为2 nm的XeF激光辐射。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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