Vandium dioxide active plasmonics

K. Ooi, P. Bai, H. Chu, L. Ang
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引用次数: 3

Abstract

The insulator-metal transition (IMT) property of vanadium dioxide provides a large, abrupt change in refractive index, making it a good candidate active material for optical modulators. We show, in this paper, that plasmonic modulators can leverage the high modulation contrast of vanadium dioxide, while at the same time solve the problems of high insertion loss and high phase-transition electric-field threshold faced by vanadium dioxide photonic modulators. Our simulation results show that vanadium dioxide plasmonic slot and hybrid-slot waveguide modulators can achieve extinction ratios in excess of 10dB/μm with insertion losses as low as 2dB/μm. We also show that vanadium dioxide can be used to build plasmonic ring modulators. These high performance modulators are foundations to realizing plasmonic nanocircuits for next-generation chip technology.
二氧化钒活性等离子体
二氧化钒的绝缘体-金属跃迁(IMT)特性提供了一个大的,突然的折射率变化,使其成为光调制器的一个很好的候选活性材料。在本文中,我们证明了等离子体调制器可以利用二氧化钒的高调制对比度,同时解决了二氧化钒光子调制器面临的高插入损耗和高相变电场阈值问题。仿真结果表明,二氧化钒等离子体槽和混合槽波导调制器的消光比超过10dB/μm,插入损耗低至2dB/μm。我们还证明了二氧化钒可以用来构建等离子环调制器。这些高性能调制器是实现下一代芯片技术等离子体纳米电路的基础。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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