HCI and NBTI Reliability Simulation for 45nm CMOS using Eldo

A. Jaafar, N. Soin, S. Hatta
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Abstract

Technology scaling on CMOS transistor causes the reliability issues is the main concern by most researchers. HCI and NBTI are the main effects that degrade the CMOS transistor. An analysis of different stages for ring oscillator is analyzed based on HCI and NBTI effect. The acceptable supply voltage for CMOS transistor also analyzed for designer to set the limitation of operational voltage for their design. Eldo simulation shows that the HCI and NBTI degradation on CMOS are stable for 11 and 23 stages of ring oscillator.
基于Eldo的45nm CMOS HCI和NBTI可靠性仿真
CMOS晶体管的技术缩放导致的可靠性问题是大多数研究者关注的主要问题。HCI和NBTI是影响CMOS晶体管性能的主要因素。基于HCI效应和NBTI效应,对环形振荡器的不同级进行了分析。分析了CMOS晶体管的可接受电源电压,为设计人员设定工作电压限制提供了依据。Eldo仿真表明,在环形振荡器的11级和23级时,CMOS上的HCI和NBTI退化是稳定的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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