High-mobility copper (I) oxide thin films prepared by reactive dc magnetron sputtering for photovoltaic applications

Y. Lee, M. Winkler, S. Siah, R. Brandt, T. Buonassisi
{"title":"High-mobility copper (I) oxide thin films prepared by reactive dc magnetron sputtering for photovoltaic applications","authors":"Y. Lee, M. Winkler, S. Siah, R. Brandt, T. Buonassisi","doi":"10.1109/PVSC.2011.6185892","DOIUrl":null,"url":null,"abstract":"Copper (I) oxide (Cu2O) is considered a promising material for low-cost photovoltaic applications. In this contribution, high-quality Cu2O films are prepared by reactive dc magnetron sputtering. We optimize deposition parameters to achieve pure Cu2O-phase thin films. We report the control of electrical, optical, and structural properties of the resulting films by varying the substrate temperature during film growth, and carefully controlling other growth parameters. We achieve a columnar grain structure with the large average grain size (884±373 nm) and high-mobility (62 cm2/V·s) at room temperature. All films exhibit an optical bandgap between 1.9 and 2.0 eV, and the samples grown at high temperature show enhanced optical transmission at wavelengths greater than 600 nm.","PeriodicalId":373149,"journal":{"name":"2011 37th IEEE Photovoltaic Specialists Conference","volume":"256 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-06-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 37th IEEE Photovoltaic Specialists Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PVSC.2011.6185892","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Copper (I) oxide (Cu2O) is considered a promising material for low-cost photovoltaic applications. In this contribution, high-quality Cu2O films are prepared by reactive dc magnetron sputtering. We optimize deposition parameters to achieve pure Cu2O-phase thin films. We report the control of electrical, optical, and structural properties of the resulting films by varying the substrate temperature during film growth, and carefully controlling other growth parameters. We achieve a columnar grain structure with the large average grain size (884±373 nm) and high-mobility (62 cm2/V·s) at room temperature. All films exhibit an optical bandgap between 1.9 and 2.0 eV, and the samples grown at high temperature show enhanced optical transmission at wavelengths greater than 600 nm.
反应性直流磁控溅射制备高迁移率氧化铜薄膜
氧化铜(Cu2O)被认为是一种很有前途的低成本光伏材料。在这篇论文中,用反应性直流磁控溅射制备了高质量的Cu2O薄膜。我们优化了沉积参数以获得纯cu20相薄膜。我们报告了通过改变薄膜生长过程中的衬底温度和仔细控制其他生长参数来控制所得到薄膜的电学、光学和结构特性。我们在室温下获得了大晶粒尺寸(884±373 nm)和高迁移率(62 cm2/V·s)的柱状晶粒结构。所有薄膜的光带隙都在1.9 ~ 2.0 eV之间,并且在高温下生长的样品在大于600 nm的波长处具有增强的光透射性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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