Time-Domain Analysis and Modeling of Large-Signal RFI Rectification in MOS Transistors

F. Torrès, C. Pouant, A. Reineix, P. Hoffmann, J. Raoult, L. Chusseau
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Abstract

Based on theoretical and experimental time-domain results, this article analyses large-signal radio-frequency interference (RFI) rectification effects in small-signal low-frequency MOS transistors. Measurements indeed show that beyond the maximum operating frequency, transistors seem to exhibit RFI rectification, which is confirmed, with excellent agreement, by SPICE simulations. Transistors models used in these simulations are extracted from measurements, and include all the parasitic elements (package and circuit). After investigating transistors' internal currents, it appears that this rectification effect is not related to active nonlinearities of the device, but to the nonlinear capacitances of the transistors: the gate-drain overlap capacitance and, for the major part, to the parasitic drain-bulk junction capacitance. A simplified model reproducing this effect is presented, and the frequency range of occurrence of the RFI rectification is analyzed.
MOS晶体管大信号RFI整流的时域分析与建模
基于理论和实验时域结果,分析了小信号低频MOS晶体管的大信号射频干扰整流效果。测量确实表明,在最大工作频率之外,晶体管似乎表现出RFI整流,这是由SPICE模拟证实的,具有极好的一致性。这些模拟中使用的晶体管模型是从测量中提取的,并包括所有寄生元件(封装和电路)。在研究了晶体管的内部电流后,似乎这种整流效应与器件的有源非线性无关,而是与晶体管的非线性电容有关:栅极-漏极重叠电容,以及寄生漏极-体结电容。给出了一个简化的模型,并对RFI整流发生的频率范围进行了分析。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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