Ultra High-speed Novel Bulk Thyristor-SRAM (BT-RAM) Cell with Selective Epitaxy Anode (SEA)

T. Sugizaki, M. Nakamura, M. Yanagita, M. Honda, M. Shinohara, T. Ikuta, T. Ohchi, K. Kugimiya, R. Yamamoto, S. Kanda, I. Yamamura, K. Yagami, T. Oda
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引用次数: 1

Abstract

We developed novel SRAM cells using bulk thyristor-RAM (BT-RAM). BT-RAM, formed on bulk Si wafers, is low cost and has good compatibility with logic process flows. BT-RAM has excellent performance, with a 100-ps read/write, high Ion/Ioff current ratio (> 108), and low standby current (< 0.5 nA/cell). We can expect the ideal cell size to be as low as 30 F2, one-fourth that of a conventional 6T-SRAM cell, by using selective epitaxy technique for anode regions (SEA). BT-RAM provides us with solutions to many inherent problems in 6T-SRAM in the 65-nm generation and beyond
具有选择性外延阳极(SEA)的超高速体晶闸管sram (BT-RAM)电池
我们使用体晶闸管ram (BT-RAM)开发了新型SRAM单元。BT-RAM在块状硅片上形成,成本低,与逻辑工艺流程具有良好的兼容性。BT-RAM具有优异的性能,具有100ps的读/写速度,高离子/断电流比(> 108)和低待机电流(< 0.5 nA/cell)。通过对阳极区域(SEA)使用选择性外延技术,我们可以期望理想的电池尺寸低至30 F2,是传统6T-SRAM电池的四分之一。BT-RAM为65纳米及以后的6T-SRAM提供了许多固有问题的解决方案
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