Calculation of electron-phonon interaction strength from first principles in graphene and silicon

W. Vandenberghe, M. Fischetti
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引用次数: 3

Abstract

The calculation of electron-phonon interaction from first principles has recently become feasible using density-functional perturbation theory (Quantum Espresso) [1] and the small displacement method (GPAW) [2]. We determine the strength of the electron-phonon interaction using the Vienna Ab-Initio Simulation Program (VASP) [3] with the small displacement method using PHONOPY [4]. We illustrate our approach using graphene and calculate the interband deformation potentials for bulk Si relevant for Band-to-Band Tunneling (BTBT).
石墨烯和硅中电子-声子相互作用强度的第一性原理计算
利用密度泛函微扰理论(Quantum Espresso)[1]和小位移法(GPAW)[2],从第一性原理计算电子-声子相互作用最近变得可行。我们使用维也纳Ab-Initio模拟程序(VASP)[3]和使用PHONOPY[4]的小位移法来确定电子-声子相互作用的强度。我们使用石墨烯说明了我们的方法,并计算了与带对带隧道(BTBT)相关的大块硅的带间变形势。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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