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Variation Effect of Silicon Film Thickness on Electrical Properties of NANOMOSFET

International journal of new computer architectures and their applications Pub Date : 1900-01-01 DOI:10.17781/P002545
A. Tijjani
{"title":"Variation Effect of Silicon Film Thickness on Electrical Properties of NANOMOSFET","authors":"A. Tijjani","doi":"10.17781/P002545","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":211757,"journal":{"name":"International journal of new computer architectures and their applications","volume":"31 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International journal of new computer architectures and their applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.17781/P002545","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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硅膜厚度变化对纳米mosfet电性能的影响
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International journal of new computer architectures and their applications
International journal of new computer architectures and their applications
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