Au-catalyzed InP nanowires: The influence of growth temperature and V/III ratio

S. Paiman, Q. Gao, H. Joyce, H. Tan, C. Jagadish, Y. Kim, Y. Guo, J. Zou
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引用次数: 0

Abstract

Growth of Au-catalyzed InP nanowires (NWs) by metalorganic chemical vapor deposition (MOCVD) has been studied in the temperature range of 400–510 °C and V/III ratio of 44–700. We demonstrate that minimal tapering of InP NWs can be achieved at 400 °C and V/III ratio of 350. Zinc-blende (ZB) or wurtzite (WZ) NWs is obtained depending on the growth conditions. 4K microphotoluminescence (μ-PL) studies show that emission energy is blue-shifted as growth temperature increases. By changing these growth parameters, one can tune the emission wavelength of InP NWs which is attractive for applications in developing novel optoelectronic devices.
金催化InP纳米线:生长温度和V/III比的影响
研究了金属有机化学气相沉积法(MOCVD)在400 ~ 510℃、V/III比44 ~ 700的温度范围内生长au催化的InP纳米线(NWs)。我们证明,在400°C和V/III比为350时,InP NWs可以达到最小的锥形。锌闪锌矿(ZB)或纤锌矿(WZ) NWs取决于生长条件。4K微光致发光(μ-PL)研究表明,随着生长温度的升高,发射能量发生蓝移。通过改变这些生长参数,人们可以调整InP NWs的发射波长,这对于开发新型光电器件具有吸引力。
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